Invention Grant
- Patent Title: Method of producing bonded silicon wafer
- Patent Title (中): 生产接合硅晶片的方法
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Application No.: US12644312Application Date: 2009-12-22
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Publication No.: US07955874B2Publication Date: 2011-06-07
- Inventor: Takashi Sakai
- Applicant: Takashi Sakai
- Applicant Address: JP Minato-ku
- Assignee: SUMCO Corporation
- Current Assignee: SUMCO Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Priority: JP2008-330993 20081225
- Main IPC: H01L21/66
- IPC: H01L21/66

Abstract:
A bonded silicon wafer is produced by a method comprising a step of implanting oxygen ions from one surface of a silicon wafer for active layer to form an oxygen ion implanted layer, a step of bonding the one surface of the silicon wafer for active layer to one surface of a silicon wafer for support layer and then conducting a heat treatment for strengthening the bonding to form a silicon wafer composite, a step of polishing a silicon portion at a side of the silicon wafer for active layer in the silicon wafer composite on a rotating platen having a polishing means and stopping the polishing at a time of detecting change of physical properties on the rotating platen resulting from the exposure of at least a part of the oxygen ion implanted layer and a step of removing the oxygen ion implanted layer.
Public/Granted literature
- US20100167425A1 METHOD OF PRODUCING BONDED SILICON WAFER Public/Granted day:2010-07-01
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