Invention Grant
- Patent Title: Semiconductor device, television set, and method for manufacturing the same
- Patent Title (中): 半导体装置，电视机及其制造方法
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Application No.: US10586663Application Date: 2005-01-24
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Publication No.: US07955907B2Publication Date: 2011-06-07
- Inventor: Shunpei Yamazaki , Hironobu Shoji , Yasuyuki Arai
- Applicant: Shunpei Yamazaki , Hironobu Shoji , Yasuyuki Arai
- Applicant Address: JP Kanagawa-Ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-Ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2004-017634 20040126; JP2004-017652 20040126
- International Application: PCT/JP2005/001280 WO 20050124
- International Announcement: WO2005/071756 WO 20050804
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84
Abstract:
An object of the invention is to provide a method for manufacturing a substrate having a film pattern such as an insulating film, a semiconductor film, or a conductive film with an easy process, and further, a semiconductor device and a television set having a high throughput or a high yield at low cost and a manufacturing method thereof. One feature of the invention is that a first film pattern is formed by a droplet discharge method, a photosensitive material is discharged or applied to the first film pattern, a mask pattern is formed by irradiating a region where the first film pattern and the photosensitive material are overlapped with a laser beam and by developing, and a second film pattern having a desired shape is formed by etching the first film pattern using the mask pattern as a mask.
Public/Granted literature
- US20080246036A1 Semiconductor Device, Television Set, and Method for Manufacturing The Same Public/Granted day:2008-10-09
Information query
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