Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
- Patent Title (中): 一种在第一主表面具有沟槽的半导体衬底的制造方法
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Application No.: US12720713Application Date: 2010-03-10
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Publication No.: US07955930B2Publication Date: 2011-06-07
- Inventor: Tadaharu Minato , Kazutoyo Takano
- Applicant: Tadaharu Minato , Kazutoyo Takano
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-162733 20070620
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L29/66

Abstract:
A semiconductor substrate has a trench in a first main surface. An insulated gate field effect part includes a gate electrode formed in the first main surface. A potential fixing electrode fills the trench and has an expanding part expanding on the first main surface so that a width thereof is larger than the width of the trench. An emitter electrode is formed on the first main surface and insulated from the gate electrode electrically and connected to a whole upper surface of the expanding part of the potential fixing electrode. Thus, a semiconductor device capable of enhancing reliability in order to prevent an aluminum spike from generating and a manufacturing method thereof can be provided.
Public/Granted literature
- US20100167516A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2010-07-01
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