Invention Grant
- Patent Title: Weak-link capacitor
- Patent Title (中): 弱连接电容
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Application No.: US12892055Application Date: 2010-09-28
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Publication No.: US07955945B1Publication Date: 2011-06-07
- Inventor: Shawn M. Dirk , Ross S. Johnson , David R. Wheeler , Gregory R. Bogart
- Applicant: Shawn M. Dirk , Ross S. Johnson , David R. Wheeler , Gregory R. Bogart
- Applicant Address: US NM Aubuquerque
- Assignee: Sandia Corporation
- Current Assignee: Sandia Corporation
- Current Assignee Address: US NM Aubuquerque
- Agent Elmer Klauetter; Kevin W. Bieg
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A process for making a dielectric material where a precursor polymer selected from poly(phenylene vinylene) polyacetylene, poly(p-phenylene), poly(thienylene vinylene), poly(1,4-naphthylene vinylene), and poly(p-pyridine vinylene) is energized said by exposure by radiation or increase in temperature to a level sufficient to eliminate said leaving groups contained within the precursor polymer, thereby transforming the dielectric material into a conductive polymer. The leaving group in the precursor polymer can be a chloride, a bromide, an iodide, a fluoride, an ester, an xanthate, a nitrile, an amine, a nitro group, a carbonate, a dithiocarbamate, a sulfonium group, an oxonium group, an iodonium group, a pyridinium group, an ammonium group, a borate group, a borane group, a sulphinyl group, or a sulfonyl group.
Information query
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