Invention Grant
US07955962B2 Method of reducing contamination by providing a removable polymer protection film during microstructure processing
有权
通过在微结构处理期间提供可除去的聚合物保护膜来减少污染的方法
- Patent Title: Method of reducing contamination by providing a removable polymer protection film during microstructure processing
- Patent Title (中): 通过在微结构处理期间提供可除去的聚合物保护膜来减少污染的方法
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Application No.: US11695657Application Date: 2007-04-03
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Publication No.: US07955962B2Publication Date: 2011-06-07
- Inventor: Ralf Richter , Frank Feustel , Thomas Werner , Kai Frohberg
- Applicant: Ralf Richter , Frank Feustel , Thomas Werner , Kai Frohberg
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Williams, Morgan & Amerson, P.C.
- Priority: DE102006035644 20060731
- Main IPC: H01L21/20
- IPC: H01L21/20
Abstract:
By providing a protective layer in an intermediate manufacturing stage, an increased surface protection with respect to particle contamination and surface corrosion may be achieved. In some illustrative embodiments, the protective layer may be used during an electrical test procedure, in which respective contact portions are contacted through the protective layer, thereby significantly reducing particle contamination during a respective measurement process.
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