Invention Grant
- Patent Title: Gas-barrier material and a method of producing the same
- Patent Title (中): 气体阻隔材料及其制造方法
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Application No.: US11910397Application Date: 2006-03-30
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Publication No.: US07956133B2Publication Date: 2011-06-07
- Inventor: Aki Endo , Hiroshi Sasaki , Yusuke Obu
- Applicant: Aki Endo , Hiroshi Sasaki , Yusuke Obu
- Applicant Address: JP Tokyo
- Assignee: Toyo Seikan Kaisha, Ltd.
- Current Assignee: Toyo Seikan Kaisha, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-099730 20050330; JP2005-358789 20051213
- International Application: PCT/JP2006/307279 WO 20060330
- International Announcement: WO2006/104257 WO 20061005
- Main IPC: C08J3/24
- IPC: C08J3/24 ; C08F8/30 ; C08F8/42 ; B32B27/30

Abstract:
A gas-barrier material in which carboxyl groups are ionically crosslinked in an amount corresponding to an acid value of at least 330 mgKOH/g of a resin that has the carboxyl groups in an amount corresponding to an acid value of not smaller than 580 mgKOH/g. The gas-barrier material exhibits excellent gas-barrier property, retort resistance and flexibility under highly humid conditions, enables the film to be cured at a low temperature in a short period of time, and can be favorably produced.
Public/Granted literature
- US20090274918A1 GAS-BARRIER MATERIAL AND A METHOD OF PRODUCING THE SAME Public/Granted day:2009-11-05
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