Invention Grant
- Patent Title: Organometallic compounds having sterically hindered amides
- Patent Title (中): 具有空间位阻酰胺的有机金属化合物
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Application No.: US11807142Application Date: 2007-05-25
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Publication No.: US07956168B2Publication Date: 2011-06-07
- Inventor: Scott Houston Meiere
- Applicant: Scott Houston Meiere
- Applicant Address: US CT Danbury
- Assignee: Praxair Technology, Inc.
- Current Assignee: Praxair Technology, Inc.
- Current Assignee Address: US CT Danbury
- Agent Iurie A. Schwartz
- Main IPC: C07F5/00
- IPC: C07F5/00

Abstract:
This invention relates to organometallic compounds represented by the formula M(NR1R2)x wherein M is a metal or metalloid, R1 is the same or different and is a hydrocarbon group or a heteroatom-containing group, R2 is the same or different and is a hydrocarbon group or a heteroatom-containing group; R1 and R2 can be combined to form a substituted or unsubstituted, saturated or unsaturated cyclic group; R1 or R2 of one (NR1R2) group can be combined with R1 or R2 of another (NR1R2) group to form a substituted or unsubstituted, saturated or unsaturated cyclic group; x is equal to the oxidation state of M; and wherein said organometallic compound has (i) a steric bulk sufficient to maintain a monomeric structure and a coordination number equal to the oxidation state of M with respect to anionic ligands, and (ii) a molecular weight sufficient to possess a volatility suitable for vapor deposition; a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.
Public/Granted literature
- US20080032062A1 Organometallic compounds having sterically hindered amides Public/Granted day:2008-02-07
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