Invention Grant
- Patent Title: Heteroleptic organometallic compounds
- Patent Title (中): 杂音有机金属化合物
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Application No.: US11899784Application Date: 2007-09-07
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Publication No.: US07956207B2Publication Date: 2011-06-07
- Inventor: Scott Houston Meiere , John D. Peck , Ronald F. Spohn , David M. Thompson
- Applicant: Scott Houston Meiere , John D. Peck , Ronald F. Spohn , David M. Thompson
- Applicant Address: US CT Danbury
- Assignee: Praxair Technology, Inc.
- Current Assignee: Praxair Technology, Inc.
- Current Assignee Address: US CT Danbury
- Agent Iurie A. Schwartz
- Main IPC: C07F7/00
- IPC: C07F7/00 ; C07F11/00 ; C23C16/00

Abstract:
This invention relates to organometallic compounds represented by the formula (L1)xM(L2)y wherein M is a metal or metalloid, L1 and L2 are different and are each a hydrocarbon group or a heteroatom-containing group; x is a value of at least 1; y is a value of at least 1; x+y is equal to the oxidation state of M; and wherein (i) L1 has a steric bulk sufficiently large such that, due to steric hinderance, x cannot be a value equal to the oxidation state of M, (ii) L2 has a steric bulk sufficiently small such that, due to lack of steric hinderance, y can be a value equal to the oxidation state of M only in the event that x is not a value of at least 1, and (iii) L1 and L2 have a steric bulk sufficient to maintain a heteroleptic structure in which x+y is equal to the oxidation state of M; a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.
Public/Granted literature
- US20080081922A1 Heteroleptic organometallic compounds Public/Granted day:2008-04-03
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