Invention Grant
- Patent Title: Method for producing halogen-substituted benzenedimethanol
- Patent Title (中): 制备卤素取代苯二甲醇的方法
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Application No.: US12160317Application Date: 2007-01-16
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Publication No.: US07956223B2Publication Date: 2011-06-07
- Inventor: Koji Hagiya
- Applicant: Koji Hagiya
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-014720 20060124
- International Application: PCT/JP2007/050869 WO 20070116
- International Announcement: WO2007/086330 WO 20070802
- Main IPC: C07C29/147
- IPC: C07C29/147

Abstract:
A method for producing a halogen-substituted benzenedimethanol represented by the formula (2): wherein X1, X2, X3 and X4 are the same or different and each independently represent a hydrogen atom or a halogen atom, provided that X1, X2, X3 and X4 are not hydrogen atoms at the same time, by reacting a halogen-substituted terephthalic acid represented by the formula (1): wherein X1, X2, X3 and X4 are the same meanings as defined above, with a borohydride compound in an organic solvent, followed by contacting the obtained reaction mixture with hydrogen chloride at 40 to 70° C.
Public/Granted literature
- US20100222613A1 METHOD FOR PRODUCING HALOGEN-SUBSTITUTED BENZENEDIMETHANOL Public/Granted day:2010-09-02
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