Invention Grant
- Patent Title: Trench IGBT with depletion stop layer
- Patent Title (中): 具有耗尽阻挡层的沟槽IGBT
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Application No.: US11265489Application Date: 2005-11-02
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Publication No.: US07956419B2Publication Date: 2011-06-07
- Inventor: Richard Francis , Chiu Ng
- Applicant: Richard Francis , Chiu Ng
- Applicant Address: US CA El Segundo
- Assignee: International Rectifier Corporation
- Current Assignee: International Rectifier Corporation
- Current Assignee Address: US CA El Segundo
- Agency: Farjami & Farjami LLP
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
A very low VCEON non punch through trench IGBT built-in non-epitaxial float zone silicon has a depletion stop layer structure added to its bottom surface.
Public/Granted literature
- US20070096167A1 Trench IGBT with depletion stop layer Public/Granted day:2007-05-03
Information query
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