Invention Grant
- Patent Title: Spatial filters
- Patent Title (中): 空间滤波器
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Application No.: US11444414Application Date: 2006-06-01
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Publication No.: US07957445B2Publication Date: 2011-06-07
- Inventor: Alex A. Behfar , Alfred T. Schremer
- Applicant: Alex A. Behfar , Alfred T. Schremer
- Applicant Address: US NY Ithaca
- Assignee: Binoptics Corporation
- Current Assignee: Binoptics Corporation
- Current Assignee Address: US NY Ithaca
- Agency: Jones, Tullar & Cooper, P.C.
- Main IPC: H01S5/00
- IPC: H01S5/00
Abstract:
An etched-facet single lateral mode semiconductor photonic device is fabricated by depositing an anti reflective coating on the etched facet, and depositing a reflectivity modifying coating in a spatially controlled manner to modify the spatial performance of the emitted beam.
Public/Granted literature
- US20060274804A1 Spatial filters Public/Granted day:2006-12-07
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