Invention Grant
- Patent Title: Methods for normalizing error in photolithographic processes
- Patent Title (中): 光刻工艺误差归一化的方法
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Application No.: US11842515Application Date: 2007-08-21
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Publication No.: US07957826B2Publication Date: 2011-06-07
- Inventor: Christopher P. Ausschnitt , Richard H. Broberg , David A. Crow , William A. Muth , Keith E. Roberts
- Applicant: Christopher P. Ausschnitt , Richard H. Broberg , David A. Crow , William A. Muth , Keith E. Roberts
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Ian MacKinnon
- Main IPC: G06F19/00
- IPC: G06F19/00
Abstract:
A method for fabricating parts using a photolithography system, includes: performing a search of normalization data for an estimated dose operating point; and using the estimated dose operating point for fabrication of new parts.
Public/Granted literature
- US20090053627A1 METHODS AND SYSTEMS FOR NORMALIZING ERROR Public/Granted day:2009-02-26
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