Invention Grant
- Patent Title: Copper contamination detection method and system for monitoring copper contamination
- Patent Title (中): 铜污染检测方法和铜污染监测系统
-
Application No.: US11863623Application Date: 2007-09-28
-
Publication No.: US07957917B2Publication Date: 2011-06-07
- Inventor: Jay Sanford Burnham , Joseph Kerry Vaughn Comeau , Leslie Peter Crane , James Randall Elliott , Scott Alan Estes , James Spiros Nakos , Eric Jeffrey White
- Applicant: Jay Sanford Burnham , Joseph Kerry Vaughn Comeau , Leslie Peter Crane , James Randall Elliott , Scott Alan Estes , James Spiros Nakos , Eric Jeffrey White
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watt
- Agent David Cain
- Main IPC: G01N30/04
- IPC: G01N30/04

Abstract:
A computer system. The computer system including a processor and memory unit coupled to the processor, the memory unit containing instructions that when executed by the processor implement a method for monitoring a solution in a tank used to fabricate integrated circuits, the method comprising the computer implemented steps of: (a) collecting data indicating of an amount of copper in a region of a substrate of a monitor, the monitor comprising an N-type region in a silicon substrate, the region abutting a top surface of the substrate, the monitor having been submerged in the solution for a preset time; (b) comparing the data to a specification for copper content of the solution; (c) if the data indicates a copper content exceeds a limit of the specification for copper, indicating a corrective action is required to prevent copper contamination of the integrated circuits; and (d) repeating steps (a) through (c) periodically.
Public/Granted literature
- US20090088984A1 COPPER CONTAMINATION DETECTION METHOD AND SYSTEM FOR MONITORING COPPER CONTAMINATION Public/Granted day:2009-04-02
Information query