Invention Grant
- Patent Title: Coating film forming apparatus and method
- Patent Title (中): 涂膜成膜装置及方法
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Application No.: US11944557Application Date: 2007-11-23
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Publication No.: US07959988B2Publication Date: 2011-06-14
- Inventor: Taro Yamamoto , Yasushi Takiguchi , Akihiro Fujimoto , Hideharu Kyouda , Junichi Kitano , Osamu Miyahara , Kenji Tsutsumi
- Applicant: Taro Yamamoto , Yasushi Takiguchi , Akihiro Fujimoto , Hideharu Kyouda , Junichi Kitano , Osamu Miyahara , Kenji Tsutsumi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-321009 20061129
- Main IPC: C23C14/28
- IPC: C23C14/28

Abstract:
A coating film forming apparatus includes a process section including one or more coating units and one or more thermally processing units; a pre-coating cleaning unit configured to perform cleaning on a back surface and an edge portion of a substrate; and a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate. A control section is configured to realize a sequence of cleaning the substrate by the pre-coating cleaning unit, checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a state of particles on a back surface and an edge portion of the substrate is within an acceptable range, and permitting transfer of the substrate into the process section where the state of particles is within the acceptable range.
Public/Granted literature
- US20080124489A1 COATING FILM FORMING APPARATUS AND METHOD Public/Granted day:2008-05-29
Information query
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