Invention Grant
- Patent Title: Resist composition and method of forming resist pattern
- Patent Title (中): 抗蚀剂图案的抗蚀剂组成和方法
-
Application No.: US12356011Application Date: 2009-01-19
-
Publication No.: US07960091B2Publication Date: 2011-06-14
- Inventor: Hiroaki Shimizu , Tsuyoshi Nakamura , Takahiro Dazai
- Applicant: Hiroaki Shimizu , Tsuyoshi Nakamura , Takahiro Dazai
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JPP2008-021698 20080131
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/26 ; G03F7/40
Abstract:
A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D), the nitrogen-containing organic compound (D) including a nitrogen-containing polymeric compound (D1) having a structural unit (d0) containing a nitrogen atom in the side chain thereof.
Public/Granted literature
- US20090197197A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2009-08-06
Information query
