Invention Grant
US07960095B2 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
有权
使用混合的底物来增强镀铬或敏感衬底上的抗蚀剂图案
- Patent Title: Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
- Patent Title (中): 使用混合的底物来增强镀铬或敏感衬底上的抗蚀剂图案
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Application No.: US10597904Application Date: 2004-02-11
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Publication No.: US07960095B2Publication Date: 2011-06-14
- Inventor: Wayne M. Moreau , Marie Angelopoulos , Wu-Song Huang , David R. Medeiros , Karen E. Petrillo
- Applicant: Wayne M. Moreau , Marie Angelopoulos , Wu-Song Huang , David R. Medeiros , Karen E. Petrillo
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Steven Capella; Katherine S. Brown
- International Application: PCT/US2004/004144 WO 20040211
- International Announcement: WO2005/088393 WO 20050922
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/30 ; G03F7/36 ; G03F7/38 ; G03F7/039
Abstract:
Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
Public/Granted literature
- US20080227030A1 Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates Public/Granted day:2008-09-18
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