Invention Grant
- Patent Title: Adjustment of masks by re-flow
- Patent Title (中): 通过再流动调整面罩
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Application No.: US12551329Application Date: 2009-08-31
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Publication No.: US07960206B2Publication Date: 2011-06-14
- Inventor: Trevor Lindsay Young , Rhett Evans
- Applicant: Trevor Lindsay Young , Rhett Evans
- Applicant Address: DE Thalheim
- Assignee: CSG Solar AG
- Current Assignee: CSG Solar AG
- Current Assignee Address: DE Thalheim
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Priority: AU2003904935 20030909
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/4763 ; H01L21/311

Abstract:
As a step in performing a process on a structure, a hole pattern is provided in a thin layer of organic resin masking material formed over the structure to provide a process mask. A processing step is then performed through the openings in the mask, and after a processing step is completed the mask is adjusted by a re-flow process in which the structure is placed into an atmosphere of solvent vapor of a solvent of the mask material. By way of the re-flow process, the mask material softens and re-flows to reduce the size of the openings in the mask causing edges of the surface areas on which the processing step was performed to be covered by the mask for subsequent processing steps.
Public/Granted literature
- US20090317938A1 ADJUSTMENT OF MASKS BY RE-FLOW Public/Granted day:2009-12-24
Information query
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