Invention Grant
- Patent Title: Method for the production of a component structure
- Patent Title (中): 组件结构的制造方法
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Application No.: US12105852Application Date: 2008-04-18
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Publication No.: US07960285B2Publication Date: 2011-06-14
- Inventor: Franz Hirler
- Applicant: Franz Hirler
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: H01L21/311
- IPC: H01L21/311

Abstract:
A method for the production of a component structure. On embodiment provides a semiconductor body having a first side. A first trench and a second trench are produced, which extend into the semiconductor body proceeding from the first side and are arranged at a distance from one another in a lateral direction of the semiconductor body. A first material layer in the first trench is produced. A third trench proceeding from the second trench is produced, extending as far as the first material layer in the first lateral direction.
Public/Granted literature
- US20090261455A1 METHOD FOR THE PRODUCTION OF A COMPONENT STRUCTURE Public/Granted day:2009-10-22
Information query
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