Invention Grant
- Patent Title: Dual cure compositions employing free radical and RTV cure
- Patent Title (中): 使用自由基和RTV固化的双重固化组合物
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Application No.: US11572738Application Date: 2005-07-22
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Publication No.: US07960445B2Publication Date: 2011-06-14
- Inventor: Anthony F. Jacobine , John G. Woods , Steven T. Nakos , Thomas Fay-Oy Lim
- Applicant: Anthony F. Jacobine , John G. Woods , Steven T. Nakos , Thomas Fay-Oy Lim
- Applicant Address: US CT Rocky Hill
- Assignee: Henkel Corporation
- Current Assignee: Henkel Corporation
- Current Assignee Address: US CT Rocky Hill
- Agent Steven C. Bauman
- International Application: PCT/US2005/025939 WO 20050722
- International Announcement: WO2006/014786 WO 20060209
- Main IPC: C03C25/10
- IPC: C03C25/10 ; C08L83/00 ; C08F8/30

Abstract:
The present invention relates to dual curing compositions, which cure with moisture and photo radiation, such as UV light, and methods for preparing and using same. In particular, the compositions of the present invention contain a polyether or polyester backbone, photocurable portion(s) and moisture curable portion(s). The photo curable portion is a urethane or carbamate linkage terminated with a (meth)acryloxyalkyl group. The moisture curable portion is either: (1) a portion terminated with a polyalkoxysilyl group; or (2) a portion having a urea linkage terminated with an alkylpolyalkoxysilyl group.
Public/Granted literature
- US20070213493A1 Dual Cure Compositions Employing Free Radical and RTV Cure Public/Granted day:2007-09-13
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