Invention Grant
- Patent Title: Radiofrequency or hyperfrequency micro-switch structure and method for producing one such structure
- Patent Title (中): 射频或超频微型开关结构及其制造方法
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Application No.: US12302525Application Date: 2007-05-31
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Publication No.: US07960662B2Publication Date: 2011-06-14
- Inventor: Afshin Ziaei
- Applicant: Afshin Ziaei
- Applicant Address: FR
- Assignee: Thales
- Current Assignee: Thales
- Current Assignee Address: FR
- Agency: Lowe Hauptman Ham & Berner, LLP
- Priority: FR0604858 20060531
- International Application: PCT/EP2007/055358 WO 20070531
- International Announcement: WO2007/138102 WO 20071206
- Main IPC: H01H51/22
- IPC: H01H51/22

Abstract:
The micro-switch structure comprises, on a substrate 1 coated with a passivation layer 2, a first signal line LS-IN and a second signal line LS-OUT disposed in the projected extension of one another, separated by a switching region 10; a control electrode 3 in said region, a dielectric material 4 with high relative permittivity invariant in frequency, disposed on the control electrode in such a manner that, between the two signal lines, the control electrode is wider on either side and, in the orthogonal direction, the dielectric protrudes on either side of the control electrode and rests on the passivation layer; parallel ground lines, disposed symmetrically on either side of the signal lines and formed on a topological level separated from that of the signal lines by at least one insulating layer made of a material different from that of the passivation layer.
Public/Granted literature
- US20090236211A1 RADIOFREQUENCY OR HYPERFREQUENCY MICRO-SWITCH STRUCTURE AND METHOD FOR PRODUCING ONE SUCH STRUCTURE Public/Granted day:2009-09-24
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