Invention Grant
- Patent Title: Stress relief of a semiconductor device
- Patent Title (中): 减轻半导体器件的应力
-
Application No.: US11835680Application Date: 2007-08-08
-
Publication No.: US07960814B2Publication Date: 2011-06-14
- Inventor: Nhat Dinh Vo
- Applicant: Nhat Dinh Vo
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Agent Kim-Marie Vo; Ranjeev Singh
- Main IPC: H01L23/544
- IPC: H01L23/544

Abstract:
A semiconductor device includes a die including an active region, a scribe region, and a perimeter, wherein the scribe region is closer to the perimeter than the active region. In one embodiment, the die further comprises a crack arrest structure formed in the scribe region, and wherein the crack arrest structure includes one of curva-linear shapes and polygonal shapes concentrically oriented around a common center located at or near at least one corner of the die.
Public/Granted literature
- US20090039470A1 STRESS RELIEF OF A SEMICONDUCTOR DEVICE Public/Granted day:2009-02-12
Information query
IPC分类: