Invention Grant
- Patent Title: Through-hole via on saw streets
- Patent Title (中): 通孔通过锯道
-
Application No.: US12496046Application Date: 2009-07-01
-
Publication No.: US07960841B2Publication Date: 2011-06-14
- Inventor: Byung Tai Do , Heap Hoe Kuan
- Applicant: Byung Tai Do , Heap Hoe Kuan
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Ltd.
- Current Assignee: STATS ChipPAC, Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group
- Agent Robert D. Atkins
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A semiconductor device is manufactured by, first, providing a wafer designated with a saw street guide. The wafer is taped with a dicing tape. The wafer is singulated along the saw street guide into a plurality of dies having a plurality of gaps between each of the plurality of dies. The dicing tape is stretched to expand the plurality of gaps to a predetermined distance. An organic material is deposited into each of the plurality of gaps. A top surface of the organic material is substantially coplanar with a top surface of a first die of the plurality of dies. A plurality of via holes is formed in the organic material. Each of the plurality of via holes is patterned to each of a plurality of bond pad locations on the plurality of dies. A conductive material is deposited in each of the plurality of via holes.
Public/Granted literature
- US20090267236A1 Through-Hole Via on Saw Streets Public/Granted day:2009-10-29
Information query
IPC分类: