Invention Grant
- Patent Title: Imaging device in a projection exposure facility
- Patent Title (中): 投影曝光设备中的成像装置
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Application No.: US12247597Application Date: 2008-10-08
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Publication No.: US07961294B2Publication Date: 2011-06-14
- Inventor: Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- Applicant: Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE10162289 20011219; DE10225266 20020607
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03B7/02

Abstract:
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
Public/Granted literature
- US20090040487A1 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY Public/Granted day:2009-02-12
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