Invention Grant
US07961297B2 Method for determining intensity distribution in the image plane of a projection exposure arrangement 有权
用于确定投影曝光装置的图像平面中的强度分布的方法

Method for determining intensity distribution in the image plane of a projection exposure arrangement
Abstract:
A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.
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