Invention Grant
- Patent Title: Positioning measurement apparatus and method
- Patent Title (中): 定位测量装置及方法
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Application No.: US11877669Application Date: 2007-10-24
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Publication No.: US07961931B2Publication Date: 2011-06-14
- Inventor: Sheng-Peng Tseng , Xiao-Man Pu
- Applicant: Sheng-Peng Tseng , Xiao-Man Pu
- Applicant Address: CN Baoan District, Shenzhen, Guangdong Province TW Banqiao Dist., New Taipei
- Assignee: Ensky Technology (Shenzhen) Co., Ltd.,Ensky Technology Co., Ltd.
- Current Assignee: Ensky Technology (Shenzhen) Co., Ltd.,Ensky Technology Co., Ltd.
- Current Assignee Address: CN Baoan District, Shenzhen, Guangdong Province TW Banqiao Dist., New Taipei
- Agent Winston Hsu; Scott Margo
- Priority: CN200610063415 20061101
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06K9/62

Abstract:
A positioning measurement method is provided. The method includes the step of: capturing images of a standard object and to-be-measured objects; selecting one or more standard points from the image of the standard object; selecting a general location area and a standard area by taking each standard point as a reference point; generating a script for recording positions of each general location area and capturing a standard image in each standard area; storing the script into the data storage; determining the position of the general location area on the image of the to-be-measured object according to the position of general location area recorded in the script; and determining a measurement area, the image in the measurement area is most similar to the standard image within the general location area.
Public/Granted literature
- US20080103726A1 POSITIONING MEASUREMENT APPARATUS AND METHOD Public/Granted day:2008-05-01
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