Invention Grant
- Patent Title: Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system
- Patent Title (中): 气体分析系统,光刻设备和提高气体分析系统灵敏度的方法
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Application No.: US12500203Application Date: 2009-07-09
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Publication No.: US07963144B2Publication Date: 2011-06-21
- Inventor: Norbertus Benedictus Koster , Richard Versluis , Bart Dinand Paarhuis
- Applicant: Norbertus Benedictus Koster , Richard Versluis , Bart Dinand Paarhuis
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- Main IPC: G01N7/00
- IPC: G01N7/00 ; G01N37/00

Abstract:
A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross -sectional area of the channel section.
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