Invention Grant
US07963247B2 Diffusion tube, dopant source for a diffusion process and diffusion method using the diffusion tube and the dopant source
失效
扩散管，用于扩散过程的掺杂剂源和使用扩散管和掺杂剂源的扩散方法
- Patent Title: Diffusion tube, dopant source for a diffusion process and diffusion method using the diffusion tube and the dopant source
- Patent Title (中): 扩散管，用于扩散过程的掺杂剂源和使用扩散管和掺杂剂源的扩散方法
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Application No.: US11673321Application Date: 2007-02-09
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Publication No.: US07963247B2Publication Date: 2011-06-21
- Inventor: Gi-bum Kim , Taek Kim , Jae-min Myoung , Min-chang Jeong
- Applicant: Gi-bum Kim , Taek Kim , Jae-min Myoung , Min-chang Jeong
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2006-0047219 20060525
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/448
Abstract:
According to an exemplary embodiment of the present invention, a diffusion tube includes a diffusion housing which includes a first cavity within a first end which receives a diffusion target, a second cavity within a second end which receives a dopant source for diffusion, and a diffusion port disposed between the diffusion target and the dopant source, wherein the diffusion port provides fluid communication between the first cavity and the second cavity.
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