Invention Grant
- Patent Title: Apparatus and methods for conditioning a polishing pad
- Patent Title (中): 用于调理抛光垫的装置和方法
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Application No.: US12636326Application Date: 2009-12-11
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Publication No.: US07963826B2Publication Date: 2011-06-21
- Inventor: Roy C. Nangoy , Shou-Sung Chang , Donald J. K. Olgado , Hung Chih Chen , Gerald John Alonzo
- Applicant: Roy C. Nangoy , Shou-Sung Chang , Donald J. K. Olgado , Hung Chih Chen , Gerald John Alonzo
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Dugan & Dugan, PC
- Main IPC: B24B1/00
- IPC: B24B1/00
Abstract:
Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.
Public/Granted literature
- US20100093263A1 APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD Public/Granted day:2010-04-15
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