Invention Grant
- Patent Title: Crystallization apparatus and crystallization method
- Patent Title (中): 结晶装置和结晶方法
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Application No.: US11926893Application Date: 2007-10-29
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Publication No.: US07964036B2Publication Date: 2011-06-21
- Inventor: Noritaka Akita , Yoshio Takami
- Applicant: Noritaka Akita , Yoshio Takami
- Applicant Address: JP Kyoto
- Assignee: Shimadzu Corporation
- Current Assignee: Shimadzu Corporation
- Current Assignee Address: JP Kyoto
- Agency: J.C. Patents
- Priority: JP2007-134185 20070521
- Main IPC: C30B11/14
- IPC: C30B11/14

Abstract:
A crystallization apparatus is provided. In the crystallization apparatus, a light intensity distribution formed by a light modulation device or a metal aperture and transferred to a processed substrate can be visualized. The crystallization apparatus has an ultraviolet (UV) irradiation system and a visible light irradiation system. The UV irradiation system irradiates pulses of laser beam in the UV range to the processed substrate. The visible light irradiation system continuously irradiates a visible light laser beam on the same irradiated region on the processed substrate. In a melted region resulted from the uniform irradiation of the laser beam in the UV range, the light intensity distribution of the visible laser beam is used to form crystal growth. The crystallization apparatus irradiates pulses of the laser beam in the UV range to melt the processed substrate, and continuously irradiates the visible light laser beam to crystallize the processed substrate.
Public/Granted literature
- US20080290300A1 CRYSTALLIZATION APPARATUS AND CRYSTALLIZATION METHOD Public/Granted day:2008-11-27
Information query
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