Invention Grant
- Patent Title: Deposition apparatus
- Patent Title (中): 沉积装置
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Application No.: US11764403Application Date: 2007-06-18
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Publication No.: US07964037B2Publication Date: 2011-06-21
- Inventor: Naoto Fukuda , Toshiaki Yoshikawa , Seiji Mashimo
- Applicant: Naoto Fukuda , Toshiaki Yoshikawa , Seiji Mashimo
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-192294 20060713
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
A vacuum deposition apparatus capable of enhancing the productivity of an organic electroluminescence device is realized. A first pipe is connected to a deposition source for evaporating an organic electroluminescence material, and two second pipes are directed to two film deposition objects comprised of substrates and masks, whereby an organic deposition film is formed. Vapor is released simultaneously from the deposition source to plural film deposition objects on different planes to deposit films, which promotes the reduction in film deposition time and the miniaturization of an apparatus.
Public/Granted literature
- US20080014825A1 DEPOSITION APPARATUS Public/Granted day:2008-01-17
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