Invention Grant
- Patent Title: Apparatus for producing trichlorosilane
- Patent Title (中): 三氯硅烷生产设备
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Application No.: US12226211Application Date: 2007-10-24
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Publication No.: US07964155B2Publication Date: 2011-06-21
- Inventor: Toshiyuki Ishii , Hideo Ito , Yuji Shimizu
- Applicant: Toshiyuki Ishii , Hideo Ito , Yuji Shimizu
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Materials Corporation
- Current Assignee: Mitsubishi Materials Corporation
- Current Assignee Address: JP Tokyo
- Agency: Edwards Angell Palmer & Dodge LLP
- Priority: JP2006-297036 20061031; JP2007-259447 20071003
- International Application: PCT/JP2007/070715 WO 20071024
- International Announcement: WO2008/053759 WO 20080508
- Main IPC: B01J19/00
- IPC: B01J19/00 ; C01B33/08 ; C01B33/04

Abstract:
An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism having a heater that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the heater is disposed in the center of the reaction vessel, and the reaction passageway is disposed in the periphery of the heater.
Public/Granted literature
- US20090155140A1 Apparatus for Producing Trichlorosilane Public/Granted day:2009-06-18
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