Invention Grant
- Patent Title: Antireflection coating composition
- Patent Title (中): 防反射涂料组合物
-
Application No.: US12544723Application Date: 2009-08-20
-
Publication No.: US07964659B2Publication Date: 2011-06-21
- Inventor: Nobuyuki Otozawa
- Applicant: Nobuyuki Otozawa
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-042418 20070222
- Main IPC: C08K5/095
- IPC: C08K5/095

Abstract:
To provide an antireflection coating composition having a low surface tension and excellent coating properties and capable of forming an antireflection film with a low refractive index, without use of PFOS nor PFOA having 7 or more carbon atoms.An antireflection coating composition which contains a fluorinated surfactant (A) containing a compound (A1) represented by the following formula (I), a water-soluble polymer (B) and an aqueous medium (C): R1—O—(R2—O)n—R3—X1 (I) wherein R1 is a linear or branched perfluoroalkyl group of which the terminal fluorine atom may be substituted by a hydrogen atom or a chlorine atom, each of R2 and R3 which are independent of each other, is a linear or branched perfluoroalkylene group, provided that the total number of carbon atoms in R1, R2 and R3 is at most 5, n is 0 or an integer of at least 1, X1 is —COOH or —C(CF2Z1)(CF2Z2)OH, which may form a salt, and each of Z1 and Z2 is a hydrogen atom, a fluorine atom, a chlorine atom or a trifluoromethyl group.
Public/Granted literature
- US20090312471A1 ANTIREFLECTION COATING COMPOSITION Public/Granted day:2009-12-17
Information query