Invention Grant
- Patent Title: Circuit board structure and fabrication method thereof
- Patent Title (中): 电路板结构及其制造方法
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Application No.: US12055546Application Date: 2008-03-26
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Publication No.: US07964801B2Publication Date: 2011-06-21
- Inventor: Chao-Wen Shih
- Applicant: Chao-Wen Shih
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: Pearne & Gordon LLP
- Main IPC: H05K1/02
- IPC: H05K1/02

Abstract:
A circuit board structure and fabrication method thereof are disclosed, including: a circuit board with a circuit layer thereon; a reactant formed on the surface of the circuit layer, wherein the reactant is an organic metallic polymer having a polymer end and a metal ion end; and a dielectric layer formed above the reactant and the circuit board, thus forming a metallic bond between the metal ion end of the reactant and the circuit layer and forming a chemical bond between the polymer end of the reactant and the dielectric layer. Owing to enhanced bonding between the dielectric layer and the circuit board, electrical performance of the circuit board structure is improved, and the demand for fine circuits is met.
Public/Granted literature
- US20080174009A1 CIRCUIT BOARD STRUCTURE AND FABRICATION METHOD THEREOF Public/Granted day:2008-07-24
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