Invention Grant
- Patent Title: Circuit substrate, circuit device and manufacturing process thereof
- Patent Title (中): 电路基板,电路装置及其制造方法
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Application No.: US12342363Application Date: 2008-12-23
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Publication No.: US07964957B2Publication Date: 2011-06-21
- Inventor: Mitsuru Noguchi , Sadamichi Takakusaki
- Applicant: Mitsuru Noguchi , Sadamichi Takakusaki
- Applicant Address: JP Moriguchi-shi JP Ora-gun
- Assignee: SANYO Electric Co., Ltd.,SANYO Semiconductor Co., Ltd.
- Current Assignee: SANYO Electric Co., Ltd.,SANYO Semiconductor Co., Ltd.
- Current Assignee Address: JP Moriguchi-shi JP Ora-gun
- Agency: Morrison & Foerster LLP
- Priority: JP2007-334237 20071226
- Main IPC: H01L23/24
- IPC: H01L23/24

Abstract:
A semiconductor device that includes a metal substrate including a top surface, a bottom surface and four side surfaces, a conductive pattern insulated from the metal substrate, and a semiconductor element mounted on and electrically connected to the conductive pattern. The top surface is insulated. Each of the side surfaces of the metal substrate includes a first inclining side surface and a second inclining side surface so as to form a convex shape protruding outwardly between the top surface and the bottom surface of the metal substrate, and the first inclining side surfaces of a pair of two opposing side surfaces are smaller than corresponding first inclining side surfaces of another pair of two opposing side surfaces.
Public/Granted literature
- US20090166895A1 CIRCUIT SUBSTRATE, CIRCUIT DEVICE AND MANUFACTURING PROCESS THEREOF Public/Granted day:2009-07-02
Information query
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