Invention Grant
US07965373B2 Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load
有权
利用具有平衡计算负荷的数据路径的平版印刷设备和设备制造方法
- Patent Title: Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load
- Patent Title (中): 利用具有平衡计算负荷的数据路径的平版印刷设备和设备制造方法
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Application No.: US11167918Application Date: 2005-06-28
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Publication No.: US07965373B2Publication Date: 2011-06-21
- Inventor: Martinus Hendricus Hendricus Hoeks , Patricius Aloysius Jacobus Tinnemans
- Applicant: Martinus Hendricus Hendricus Hoeks , Patricius Aloysius Jacobus Tinnemans
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/54 ; G06F17/50 ; G06F19/00
Abstract:
A lithography apparatus with a data-path for converting a representation of a requested dose pattern to a sequence of control data suitable for controlling an array of individually controllable elements. The data path comprises a plurality of data manipulation devices and a calculation load controller for balancing a calculation load between the data manipulation devices. A device manufacturing method using elements of the lithography apparatus, and a flat panel display and integrated circuit device manufactured using the method.
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