Invention Grant
US07965378B2 Optical system and method for illumination of reflective spatial light modulators in maskless lithography
有权
用于无掩模光刻中的反射空间光调制器的照明的光学系统和方法
- Patent Title: Optical system and method for illumination of reflective spatial light modulators in maskless lithography
- Patent Title (中): 用于无掩模光刻中的反射空间光调制器的照明的光学系统和方法
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Application No.: US11708131Application Date: 2007-02-20
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Publication No.: US07965378B2Publication Date: 2011-06-21
- Inventor: Stanislav Y. Smirnov , Kirill Y. Sobolev
- Applicant: Stanislav Y. Smirnov , Kirill Y. Sobolev
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V
- Current Assignee: ASML Holding N.V
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/54
- IPC: G03B27/54
Abstract:
An illuminator for a lithography system is provided. The illuminator includes a mask positioned along an optical axis and first and second refractive groupings positioned along the axis in cooperative arrangement with the mask. Also included are first and second reflecting devices for reflecting an image output from the first and second refractive groupings and a spatial light modulator (SLM) positioned along the axis in cooperative arrangement with the first and second reflecting devices. The active areas of the mask and the SLM are positioned off-axis.
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