Invention Grant
- Patent Title: Structure for pattern formation, method for pattern formation, and application thereof
- Patent Title (中): 图案形成结构，图案形成方法及其应用
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Application No.: US11867842Application Date: 2007-10-05
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Publication No.: US07965446B2Publication Date: 2011-06-21
- Inventor: Hironori Kobayashi , Manabu Yamamoto , Daigo Aoki , Hironori Kamiyama , Shinichi Hikosaka , Mitsuhiro Kashiwabara
- Applicant: Hironori Kobayashi , Manabu Yamamoto , Daigo Aoki , Hironori Kamiyama , Shinichi Hikosaka , Mitsuhiro Kashiwabara
- Applicant Address: JP Tokyo-to
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo-to
- Agency: Ladas & Parry LLP
- Priority: JP9-214845 19970808; JP9-300295 19971031; JP9-313041 19971114; JP10-100369 19980327; JP10-085955 19980331; JP10-086293 19980331; JP10-165392 19980612; JP10-167316 19980615; JP10-183370 19980615
- Main IPC: G02B27/10
- IPC: G02B27/10
Abstract:
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
Public/Granted literature
- US20080043337A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF Public/Granted day:2008-02-21
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