Invention Grant
- Patent Title: Monolithic semiconductor laser
- Patent Title (中): 单片半导体激光器
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Application No.: US11990843Application Date: 2006-08-23
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Publication No.: US07965753B2Publication Date: 2011-06-21
- Inventor: Tetsuhiro Tanabe
- Applicant: Tetsuhiro Tanabe
- Applicant Address: JP Kyoto-Shi
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto-Shi
- Agency: Rabin & Berdo, PC
- Priority: JP2005-242327 20050824
- International Application: PCT/JP2006/316476 WO 20060823
- International Announcement: WO2007/023845 WO 20070301
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
An infrared element (10a) which includes at least a light emitting layer forming portion (9a) composed of, for example, a first conductivity type cladding layer (2a), an active layer (3a), and a second conductivity type cladding layer (4a) for emitting infrared light, is formed on a semiconductor substrate (1), and a red element (10b) which includes at least a light emitting layer forming portion (9b) composed of, for example, a first conductivity type cladding layer (2b), an active layer (3b), and a second conductivity type cladding layer (4b) for emitting red light, is formed on the same semiconductor substrate (1). And their second conductivity type cladding layers (4a and 4b) are made of the same material. As a result, forming process of their ridge portions may be communized and both of the elements can be formed respectively, with a window structure capable of high output operation.
Public/Granted literature
- US20090086781A1 Monolithic semiconductor laser Public/Granted day:2009-04-02
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