Invention Grant
US07965753B2 Monolithic semiconductor laser 有权
单片半导体激光器

  • Patent Title: Monolithic semiconductor laser
  • Patent Title (中): 单片半导体激光器
  • Application No.: US11990843
    Application Date: 2006-08-23
  • Publication No.: US07965753B2
    Publication Date: 2011-06-21
  • Inventor: Tetsuhiro Tanabe
  • Applicant: Tetsuhiro Tanabe
  • Applicant Address: JP Kyoto-Shi
  • Assignee: Rohm Co., Ltd.
  • Current Assignee: Rohm Co., Ltd.
  • Current Assignee Address: JP Kyoto-Shi
  • Agency: Rabin & Berdo, PC
  • Priority: JP2005-242327 20050824
  • International Application: PCT/JP2006/316476 WO 20060823
  • International Announcement: WO2007/023845 WO 20070301
  • Main IPC: H01S5/00
  • IPC: H01S5/00
Monolithic semiconductor laser
Abstract:
An infrared element (10a) which includes at least a light emitting layer forming portion (9a) composed of, for example, a first conductivity type cladding layer (2a), an active layer (3a), and a second conductivity type cladding layer (4a) for emitting infrared light, is formed on a semiconductor substrate (1), and a red element (10b) which includes at least a light emitting layer forming portion (9b) composed of, for example, a first conductivity type cladding layer (2b), an active layer (3b), and a second conductivity type cladding layer (4b) for emitting red light, is formed on the same semiconductor substrate (1). And their second conductivity type cladding layers (4a and 4b) are made of the same material. As a result, forming process of their ridge portions may be communized and both of the elements can be formed respectively, with a window structure capable of high output operation.
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