Invention Grant
US07965756B2 Optical element for gas laser and gas laser apparatus using the same
有权
用于气体激光的光学元件和使用其的气体激光装置
- Patent Title: Optical element for gas laser and gas laser apparatus using the same
- Patent Title (中): 用于气体激光的光学元件和使用其的气体激光装置
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Application No.: US12545495Application Date: 2009-08-21
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Publication No.: US07965756B2Publication Date: 2011-06-21
- Inventor: Osamu Wakabayashi , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
- Applicant: Osamu Wakabayashi , Shinji Nagai , Kouji Kakizaki , Satoshi Tanaka
- Applicant Address: JP Toyko
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Toyko
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2008-213531 20080822
- Main IPC: H01S3/22
- IPC: H01S3/22

Abstract:
At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
Public/Granted literature
- US20100054297A1 OPTICAL ELEMENT FOR GAS LASER AND GAS LASER APPARATUS USING THE SAME Public/Granted day:2010-03-04
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