Invention Grant
- Patent Title: Multi-variable regression for metrology
- Patent Title (中): 计量学的多元回归
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Application No.: US12103690Application Date: 2008-04-15
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Publication No.: US07966142B2Publication Date: 2011-06-21
- Inventor: Wen Zhan Zhou , Zheng Zou , Jasper Goh , Mei Sheng Zhou
- Applicant: Wen Zhan Zhou , Zheng Zou , Jasper Goh , Mei Sheng Zhou
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Horizon IP Pte. Ltd.
- Main IPC: G01D21/00
- IPC: G01D21/00 ; G06F19/00

Abstract:
A method for assessing metrology tool accuracy is described. Multi-variable regression is used to define the accuracy of a metrology tool such that the interaction between different measurement parameters is taken into account. A metrology tool under test (MTUT) and a reference metrology tool (RMT) are used to measure a set of test profiles. The MTUT measures the test profiles to generate a MTUT data set for a first measurement parameter. The RMT measures the test profiles to generate RMT data sets for the first measurement parameter, and at least a second measurement parameter. Multi-variable regression is then performed to generate a best-fit plane for the data sets. The coefficient of determination (R2 value) represents the accuracy index of the MTUT.
Public/Granted literature
- US20090258445A1 MULTI-VARIABLE REGRESSION FOR METROLOGY Public/Granted day:2009-10-15
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