Invention Grant
- Patent Title: Light-emitting device and method for manufacturing the same
- Patent Title (中): 发光装置及其制造方法
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Application No.: US12453183Application Date: 2009-05-01
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Publication No.: US07968867B2Publication Date: 2011-06-28
- Inventor: Chiu-Lin Yao , Ta-Cheng Hsu
- Applicant: Chiu-Lin Yao , Ta-Cheng Hsu
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Bacon & Thomas, PLLC
- Priority: TW97116548A 20080502
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A light-emitting device and the method for making the same is disclosed. The light-emitting device is a semiconductor device, comprising a growth substrate, an n-type semiconductor layer, a quantum well active layer and a p-type semiconductor layer. It combines the holographic and the quantum well interdiffusion (QWI) to form a photonic crystal light-emitting device having a dielectric constant of two-dimensional periodic variation or a material composition of two-dimensional periodic variation in the quantum well active layer. The photonic crystal light-emitting devices can enhance the internal efficiency and light extraction efficiency.
Public/Granted literature
- US20090272964A1 Light-emitting device and method for manufacturing the same Public/Granted day:2009-11-05
Information query
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