Invention Grant
- Patent Title: Inductor utilizing pad metal layer
- Patent Title (中): 电感利用垫金属层
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Application No.: US12790526Application Date: 2010-05-28
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Publication No.: US07968968B2Publication Date: 2011-06-28
- Inventor: Sung-Hsiung Wang , Chih-Ping Chao , Chia-Yu Su
- Applicant: Sung-Hsiung Wang , Chih-Ping Chao , Chia-Yu Su
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L27/08
- IPC: H01L27/08

Abstract:
An inductor utilizing a pad metal layer. The inductor comprises a metal spiral, a metal bridge, and a metal interconnect. The metal bridge is formed with the pad metal layer and a plurality of vias and has one end connected to the metal spiral. The metal interconnect is connected to the other end of the metal bridge. In addition, resistivity of the pad metal layer is lower than that of the metal spiral.
Public/Granted literature
- US20100265025A1 INDUCTOR UTILIZING PAD METAL LAYER Public/Granted day:2010-10-21
Information query
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