Invention Grant
- Patent Title: Method and system for defect detection
- Patent Title (中): 缺陷检测方法和系统
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Application No.: US11831675Application Date: 2007-07-31
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Publication No.: US07970201B2Publication Date: 2011-06-28
- Inventor: Michael Ben-Yishay , Ophir Gvirtzer
- Applicant: Michael Ben-Yishay , Ophir Gvirtzer
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: SNR Denton US LLP
- Main IPC: G06K9/56
- IPC: G06K9/56 ; G06K9/40

Abstract:
A system, method and computer program product for defect detection, the method includes: (i) retrieving a second pixel of a second image that corresponds to a tested pixel of a first image of the object; wherein the first and second images were obtained using different acquisition methods; (ii) searching a third pixel of the second image such that a neighborhood of the second pixel is similar to a neighborhood of the third pixel; (iii) retrieving a fourth pixel of the first image that corresponds to the third pixel; and (iv) comparing between the tested pixel and the fourth pixel.
Public/Granted literature
- US20080075355A1 Method and system for defect detection Public/Granted day:2008-03-27
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