Invention Grant
- Patent Title: Planar grooved power inductor structure and method
- Patent Title (中): 平面沟槽功率电感结构及方法
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Application No.: US13007551Application Date: 2011-01-14
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Publication No.: US07971340B2Publication Date: 2011-07-05
- Inventor: François Hébert , Tao Feng , Jun Lu
- Applicant: François Hébert , Tao Feng , Jun Lu
- Applicant Address: BM Hamilton
- Assignee: Alpha & Omega Semiconductor, Ltd
- Current Assignee: Alpha & Omega Semiconductor, Ltd
- Current Assignee Address: BM Hamilton
- Agency: JDI Patent
- Agent Joshua D. Isenberg
- Main IPC: H01F7/02
- IPC: H01F7/02

Abstract:
An inductor may include a planar ferrite core. A first group of one or more grooves is formed in a first side of the ferrite core. A second group of two or more grooves is formed in a second side of the ferrite core. The grooves in the first and second groups are oriented such that each groove in the first group overlaps with two corresponding grooves in the second group. A first plurality of vias communicates through the ferrite core between the first and second sides of the ferrite core. Each via is located where a groove in the first group overlaps with a groove in the second group. A conductive material is disposed in the first and second groups of grooves and in the vias to form an inductor coil.
Public/Granted literature
- US20110107589A1 PLANAR GROOVED POWER INDUCTOR STRUCTURE AND METHOD Public/Granted day:2011-05-12
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