Invention Grant
- Patent Title: Slotted guide structure
- Patent Title (中): 开槽导向结构
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Application No.: US11982139Application Date: 2007-10-31
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Publication No.: US07972522B2Publication Date: 2011-07-05
- Inventor: Emmanuel Jordana , Jean-Marc Fedeli , Loubna El Melhaoui
- Applicant: Emmanuel Jordana , Jean-Marc Fedeli , Loubna El Melhaoui
- Applicant Address: FR Paris
- Assignee: Commissariat A L'Energie Atomique
- Current Assignee: Commissariat A L'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Nixon Peabody LLP
- Priority: FR0654669 20061031
- Main IPC: H01B13/00
- IPC: H01B13/00

Abstract:
The invention relates to a method for producing a slotted guide, in which: a) a layer of a material having a refractive index less than that of silicon, for example Material having a refractive index less than that of silicon (26), is formed on an etching barrier layer (22), b) two parallel trenches are etched into said material having a refractive index less than that of silicon, with the etching barrier on said etching barrier layer, these two trenches being separated by a wall of said material having a refractive index less than that of silicon (36), c) the trenches thus made are filled with silicon (42, 44).
Public/Granted literature
- US20080099425A1 New slotted guide structure Public/Granted day:2008-05-01
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