Invention Grant
- Patent Title: Method for imprint lithography at constant temperature
- Patent Title (中): 恒温压印光刻方法
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Application No.: US11579540Application Date: 2004-11-25
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Publication No.: US07972553B2Publication Date: 2011-07-05
- Inventor: Marc Beck , Babak Heidari , Erik Bolmsjö , Erik Theander
- Applicant: Marc Beck , Babak Heidari , Erik Bolmsjö , Erik Theander
- Applicant Address: SE Malmo
- Assignee: Obducat AB
- Current Assignee: Obducat AB
- Current Assignee Address: SE Malmo
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: EP04445057 20040507
- International Application: PCT/EP2004/053106 WO 20041125
- International Announcement: WO2005/109095 WO 20051117
- Main IPC: B29C35/02
- IPC: B29C35/02 ; B29C35/08

Abstract:
Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.
Public/Granted literature
- US20070164487A1 Method for imprint lithography at constant temperature Public/Granted day:2007-07-19
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