Invention Grant
US07972754B2 Fluorinated polymer, negative photosensitive resin composition and partition walls
失效
氟化聚合物,负型感光性树脂组合物和分隔壁
- Patent Title: Fluorinated polymer, negative photosensitive resin composition and partition walls
- Patent Title (中): 氟化聚合物,负型感光性树脂组合物和分隔壁
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Application No.: US12138648Application Date: 2008-06-13
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Publication No.: US07972754B2Publication Date: 2011-07-05
- Inventor: Hideyuki Takahashi , Kenji Ishizeki
- Applicant: Hideyuki Takahashi , Kenji Ishizeki
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-361910 20051215
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F8/30

Abstract:
To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition.A fluorinated polymer which is a copolymer made of at least two monomers each having an ethylenic double bond, and which has a side chain having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain an etheric oxygen atom between carbon atoms) and a side chain having at least two ethylenic double bonds per side chain.
Public/Granted literature
- US20080254388A1 FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS Public/Granted day:2008-10-16
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