Invention Grant
- Patent Title: Chemically amplified positive resist composition
- Patent Title (中): 化学放大正光刻胶组合物
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Application No.: US11984098Application Date: 2007-11-13
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Publication No.: US07972763B2Publication Date: 2011-07-05
- Inventor: Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
- Applicant: Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-321460 20061129
- Main IPC: G03F7/039
- IPC: G03F7/039
Abstract:
The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
Public/Granted literature
- US20080153036A1 Chemically amplified positive resist compostion Public/Granted day:2008-06-26
Information query
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