Invention Grant
- Patent Title: Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
- Patent Title (中): 电子束写入方法,精细图案写入系统,制造不均匀图案的衬底的方法以及制造磁盘介质的方法
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Application No.: US12277627Application Date: 2008-11-25
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Publication No.: US07972764B2Publication Date: 2011-07-05
- Inventor: Kazunori Komatsu , Toshihiro Usa
- Applicant: Kazunori Komatsu , Toshihiro Usa
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2007-308367 20071129
- Main IPC: G03C5/00
- IPC: G03C5/00

Abstract:
When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape of each of the elements by vibrating the electron beam rapidly in a radius direction of the rotation stage and at the same time deflecting in a direction orthogonal to the radius direction of the rotation stage faster than a rotational speed thereof, thereby sequentially writing the elements.
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