Invention Grant
US07972764B2 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium 有权
电子束写入方法,精细图案写入系统,制造不均匀图案的衬底的方法以及制造磁盘介质的方法

  • Patent Title: Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
  • Patent Title (中): 电子束写入方法,精细图案写入系统,制造不均匀图案的衬底的方法以及制造磁盘介质的方法
  • Application No.: US12277627
    Application Date: 2008-11-25
  • Publication No.: US07972764B2
    Publication Date: 2011-07-05
  • Inventor: Kazunori KomatsuToshihiro Usa
  • Applicant: Kazunori KomatsuToshihiro Usa
  • Applicant Address: JP Tokyo
  • Assignee: Fujifilm Corporation
  • Current Assignee: Fujifilm Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Young & Thompson
  • Priority: JP2007-308367 20071129
  • Main IPC: G03C5/00
  • IPC: G03C5/00
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
Abstract:
When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape of each of the elements by vibrating the electron beam rapidly in a radius direction of the rotation stage and at the same time deflecting in a direction orthogonal to the radius direction of the rotation stage faster than a rotational speed thereof, thereby sequentially writing the elements.
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