Invention Grant
- Patent Title: Microresonator systems and methods of fabricating the same
- Patent Title (中): 微谐振器系统及其制造方法
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Application No.: US12479604Application Date: 2009-06-05
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Publication No.: US07972882B2Publication Date: 2011-07-05
- Inventor: Michael Renne Ty Tan , Shih-Yuan Wang , Duncan Stewart , David A. Fattal
- Applicant: Michael Renne Ty Tan , Shih-Yuan Wang , Duncan Stewart , David A. Fattal
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Various embodiments of the present invention are related to microresonator systems and to methods for fabricating the microresonator systems. In one embodiment, a method of fabricating a microresonator system comprises: forming a multilayer system having a bottom layer, a top layer, and an intermediate layer having one or more quantum wells and sandwiched between the bottom layer and the top layer; embedding at least one waveguide in a substrate having a top surface, the at least one waveguide positioned adjacent to the top surface of the substrate; wafer bonding the top layer of the multilayer system to the top surface of the substrate; forming a microresonator in the multilayer system, wherein at least a portion of a peripheral annular region of the microresonator is portioned above the at least one waveguide; and forming a current isolation region in at least a portion of a central region of the microresonator.
Public/Granted literature
- US20090239323A1 Microresonator Systems And Methods Of Fabricating The Same Public/Granted day:2009-09-24
Information query
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